The Voyager PIB-CVD is a plasma ion beam assisted Chemical Vapor Deposition (PIB-CVD) system built around the filament-free Endeavor RF Ion Source. This patented ion source, by design, has independent control of both ion current density and ion energy over a wide range, capable of producing high deposition rate multi-layer coatings. It is able to deposit high rate, high quality coatings at low temperature (below 100°C), making it compatible with typical plastic substrates such as polycarbonate (PC) and polymethylmethacrylate (PMMA).
The Voyager PIB-CVD system was designed with a focus on diamond-like nanocomposite (DLN) to provide best-in-class flexibility to coat planar (ex. silicon wafers), and three-dimensional parts (ex. optical lenses). The system is configured with Denton’s Process Pro control system, allowing for automated and manual process control.
In addition, there is an optional proprietary chamber configuration to enable co-sputtering during DLN deposition for DLN (Me-DLN) films. This configuration is unique in the industry and opens up the potential to develop novel DLN films with tailorable mechanical, electrical, and tribological properties.