The production-proven Discovery platform can handle substrates up to 300mm. The cluster configuration makes it suitable for multi-layer, oxygen-sensitive applications and high throughput requirements. The platform accommodates DC, pulsed DC, and RF sputtering, which feature the single-cathode configuration for high uniformity, as well as confocal co-sputtering capability. Denton’s proprietary PEM technology enables high rate reactive sputtering of metal oxides and nitrides.
Ion assisted deposition is also available. With independent electro-pneumatic source shutters and chimney assemblies, you can prevent cross-contamination of your source material. Multiple pump configurations, including cryogenic and turbo, as well as pump placement options provide the design flexibility we need to meet your process and productivity requirements.
