See how Denton Vacuum has pioneered thin film for 6 decades.
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Denton’s Phoenix system platform is designed for high-volume in-line production. The system comes in two primary configurations: the Phoenix LC for magnetron sputtering with a rectangular or rotary linear cathode, and the Phoenix PIB-CVD for room-temperature chemical vapor deposition. Both systems can be configured with multiple sources to support a variety of applications. In this… Read More
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Thin films obtained by standard chemical vapor deposition (CVD) typically require temperatures ranging from 600°C to 800°C. Using plasma enhanced CVD (PE-CVD) allows reactions to occur at temperatures down to 350°C. Plasma ion beam CVD (PIB-CVD) advances this process even further by allowing room temperature deposition. Without the need to heat a substrate to such… Read More
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In thin films obtained by Chemical Vapor Deposition (CVD), chemical reactions are driven by applying heat to the substrate to be coated or to the area immediately around the substrate. Reactive precursor gasses are then introduced into the deposition chamber and react immediately with the heated substrate surface or combine to form new compounds that… Read More
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In the world of thin film deposition, there are few techniques that have the versatility of PIB-CVD. Short for plasma ion beam assisted chemical vapor deposition, PIB-CVD is a cutting-edge thin film deposition process that can be used to deposit large area multifunctional thin films with greater efficiency as well as engineer new materials. What… Read More
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Welcome to the Denton Vacuum Applications Laboratory Denton Vacuum has hit a milestone with the Customer Application Development Center, the Apps Lab, as we pass the 10-year mark. The CADC empowers innovation by producing state-of-the-art sputtered, etch, and evaporated thin films and evaluating machine performances with our cutting-edge tools. In the CADC, Denton has three… Read More
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The process tunability of PIB-CVD makes it optimal for many thin film applications. The inherent tunability of PIB-CVD enables a wide range of film properties including flowable, soft, thin film encapsulation layers as well as hard, highly hydrophobic, and optically clear coatings. As a result, multilayer and gradient coatings can be produced in a single chamber from… Read More
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As manufacturers look to introduce exciting new features to customers and increase device lifespan in consumer electronics applications, thin film coating requirements are beginning to change as well. Durability and performance continue to be critical but flexibility and ultra-thin coatings are increasingly in demand. Emerging display applications are seeing new form factors and a heavy shift… Read More
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Infrared optics, or IR optics, are growing in demand due to their ability to aid in navigation and surveillance in a few different markets. These optical devices differ from other optics because they deal with infrared light instead of visible light, which creates specific thin film requirements for their manufacturing. What is Infrared Light? To… Read More
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Edge-emitting lasers (EELs) and vertical cavity surface emitting lasers (VCSELs) are two different types of diode lasers. EELs are well established in the opto-electronics market, but there are some limitations for manufacturers. VCSELs are also well-established in opto-electronics (particularly datacom), but as the technology matures, they will be better equipped to address those manufacturing challenges… Read More
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There are two types of acoustic wave components that play a role in RF filter technologies: surface acoustic wave (SAW) and BAW (bulk acoustic wave). They are both important devices for filtering and amplifying RF signals in many applications using wireless communication, and a repeatable, high-vacuum thin film coating process is needed to ensure good… Read More