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Oxide thin film coatings have a number of different uses, including optical and semiconductor applications. For these thin films, hitting the right specs is absolutely critical to performance. When those specs are reached with the right thin film deposition process, oxide films provide a variety of benefits. Benefits and Uses for Oxide Films In optics,… Read More
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Laser applications may see weak growth in revenues in 2019, but there are still a few areas that are expected to pace the industry. Here’s a breakdown of the factors at play for manufacturers in 2019. Market Risks The laser market is not immune to the blowback from tariffs that’s currently plaguing many global and… Read More
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Thin film thickness uniformity is one of the main components of yield. Parts coated with a film that is outside the limits will need to be either reworked or scrapped. However, it is important not to over-specify the uniformity. If your design demands +/-5% uniformity and you specify +/-2% because it is “better”, you will… Read More
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Repeatability is a key factor in any production process. Along with uniformity, it ultimately determines the yield of any thin film deposition process. When designing a thin film system configuration for high-volume manufacturing, repeatability becomes especially paramount. Why is Repeatability Important? Accuracy (hitting the middle of a spec) and precision (repeatable results) are the two… Read More
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To scale smoothly into high-volume manufacturing, you need to be prepared to meet higher throughput requirements without impacting your process control. This means investing in the right thin film system configuration to meet your demanding throughput needs. Factors to Consider When selecting a thin film deposition system for high-volume production, there are a number of… Read More
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When comparing the four main types of physical vapor deposition (PVD) for thin films, it is important to know the benefits and drawbacks of each before you decide which method will best suit your application. PVD can occur through sputtering (magnetron or ion beam), which utilizes energetic ions colliding with a target to eject (or… Read More
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As demand for popular consumer electronics and next-generation technologies has risen over the years, the opto-electronics market has grown with it. Despite global trade tension and tariffs creating challenges in this space, companies are still expecting to generate revenue growth in 2019. Cree, Inc., cited these challenges as “headwinds” in their first-quarter 2019 earnings report,… Read More
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This November, many companies will take advantage of surplus capital before their budget is set for the upcoming year. In a recent survey of nearly 150 compound semiconductor manufacturers on their capital expense budgets, around 42% of companies predict their capex budget will increase in 2019, while 31% predict a decrease. In an ever-changing business… Read More
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If you’re looking to improve productivity in your sputtering process, there are several front-end options available to use. When paired with a compatible standard sputter chamber, these front-end options can be used to increase throughput and production efficiency while providing consistent, repeatable results. Front-end Options Single Chamber, Single Wafer Loadport: This type of front-end option… Read More
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In indium bump deposition, there is a tradeoff between closure rate and closure uniformity. A slower closure rate and high closure uniformity is ideal, but often, the closer you get to your desired specs in one area, the more you sacrifice with the other. Closure Rate vs. Closure Uniformity Closure rate: This refers to the… Read More