See how Denton Vacuum has pioneered thin film for 6 decades.
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In thin films obtained by Chemical Vapor Deposition (CVD), chemical reactions are driven by applying heat to the substrate to be coated or to the area immediately around the substrate. Reactive precursor gasses are then introduced into the deposition chamber and react immediately with the heated substrate surface or combine to form new compounds that… Read More
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One device helping make the carbon-free future more of a reality is the electrolyzer. Hydrogen is emerging as an increasingly important fuel source, and electrolyzers use electricity to perform electrolysis – the process of dividing water molecules into their separate components of hydrogen gas and oxygen gas. The oxygen and hydrogen can then be compressed… Read More
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Factory throughput in thin film deposition is one of the most critical factors affecting overall production performance. Whether you are manufacturing for high or low volume applications, you need to be able to meet production needs in the most cost-effective way possible, and scale into higher production when needed. Finding ways to raise your factory… Read More
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In the world of thin film deposition, there are few techniques that have the versatility of PIB-CVD. Short for plasma ion beam assisted chemical vapor deposition, PIB-CVD is a cutting-edge thin film deposition process that can be used to deposit large area multifunctional thin films with greater efficiency as well as engineer new materials. What… Read More
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Welcome to the Denton Vacuum Applications Laboratory Denton Vacuum has hit a milestone with the Customer Application Development Center, the Apps Lab, as we pass the 10-year mark. The CADC empowers innovation by producing state-of-the-art sputtered, etch, and evaporated thin films and evaluating machine performances with our cutting-edge tools. In the CADC, Denton has three… Read More
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Denton Vacuum is a leading supplier of process equipment for manufacturing semiconductor and opto-electronic devices focusing on innovative technology and application-specific configurations. Partner with Process Experts In our video, hear from Denton’s own Dr. David Douglass, Vice President of Marketing and Technology, as he details the advantages of application-specific configurations over engineered-to-order systems. This provides… Read More
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At the end of every fiscal year, many companies take advantage of surplus capital before their budget is set for the upcoming year. In an ever-changing business landscape, it’s crucial to maximize your capex budget in as many areas as possible. To do this while increasing your factory output, choose the thin film deposition process… Read More
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Enable uniform removal of the entire layer regardless of chemical composition The Infinity FA from Denton Vacuum is optimized for delayering applications. The Infinity FA can utilize multiple etch technologies for uniform removal of layers. This high-performance etch tool is designed for delayering finished or in-process integrated circuits for failure analysis or reverse engineering. Learn… Read More
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Join Frank Cumbo, President and CEO of Denton Vacuum, as he discusses the promising future of the company. Denton Vacuum is seeing great success in many markets ranging from semiconductors, optoelectronics, and IR detectors to display, microanalysis, and sample preparation. Hear more about their plan to stay competitive as chip production ramps up and where… Read More
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PIB-CVD is a groundbreaking thin film deposition technology with a wide range of tunability, scalability, and durability. A primary feature of PIB-CVD is that the ion current density and the ion energy can both be independently controlled without the need for substrate biasing or additional grids. To learn more about the configurations, treatments, and other… Read More