A physical vapor deposition process that uses ion bombardment to eject material from a target onto a substrate
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For over half a decade, Denton Vacuum has developed deposition and etch technology that enable users to enhance and innovate their research techniques and manufacturing processes. Discovering ground-breaking technology is not always a straightforward path. It takes a willingness to try, fail, and try again. At Denton, we take pride in our willingness to fail… Read More
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Magnetron sputtering is a plasma-based technique for physical vapor deposition (or PVD) coating that creates dense films with good adhesion. It is excellent for depositing materials with high melting points that cannot be evaporated, and it has the highest scalability of any PVD type. Magnetron sputtering provides excellent precision in film thickness and density of… Read More
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Traditional ion beam sputtering (IBS) provides excellent control over ion energies and thin film stoichiometry, making it the process of choice for sputtering metals and dielectrics for applications such as vanadium oxide microbolometers and VCSELs. Still, IBS has various challenges in meeting the necessary standards for applications in which a high degree of precision and… Read More
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Magnetron sputtering is a versatile deposition technique that creates very dense films with good adhesion. It can easily deposit materials with high melting points that cannot be evaporated. Denton Vacuum’s magnetron sputtering systems are highly configurable with multiple cathode options to meet the specific requirements of different applications. In this article, we discuss the multiple… Read More
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When selecting a physical vapor technique for your manufacturing process, the end application will greatly affect which technique is best. While PVD has many forms, there are two prominent techniques: evaporation and sputtering. Sputtering through magnetron or ion beam (IBS) utilizes energetic ions colliding with a target to eject (or sputter) target material. Thermal resistive… Read More
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The goal of any thin film deposition method is to create a high-quality uniform film across the entire surface of a substrate. Unfortunately, defects such as spits, particles, and voids can interfere with your ability to reach desired film quality. If necessary, there are ways to adjust a manufacturing process to eliminate such defects and… Read More
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One device helping make the carbon-free future more of a reality is the electrolyzer. Hydrogen is emerging as an increasingly important fuel source, and electrolyzers use electricity to perform electrolysis – the process of dividing water molecules into their separate components of hydrogen gas and oxygen gas. The oxygen and hydrogen can then be compressed… Read More
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Factory throughput in thin film deposition is one of the most critical factors affecting overall production performance. Whether you are manufacturing for high or low volume applications, you need to be able to meet production needs in the most cost-effective way possible, and scale into higher production when needed. Finding ways to raise your factory… Read More
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In the world of thin film deposition, there are few techniques that have the versatility of PIB-CVD. Short for plasma ion beam assisted chemical vapor deposition, PIB-CVD is a cutting-edge thin film deposition process that can be used to deposit large area multifunctional thin films with greater efficiency as well as engineer new materials. What… Read More
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Denton offers a number of magnetron configurations to meet different application requirements. Magnetron sputtering is a highly versatile thin film deposition technique for coating films with excellent adhesion and high density. Magnetron sputtering is a plasma-based coating process where a magnetically confined plasma is created near the surface of a target material. Positively charged energetic… Read More