Deposition and etch techniques for sample preparation and failure analysis
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Conventional failure analysis methods have failed to scale with modern semiconductors, which are larger, more complex, and incorporate a wider variety of materials than ever before. Ion Beam Etch, or IBE, overcomes the challenges that conventional failure analysis methods cannot. IBE provides a uniform etch no matter the material, exposes large areas of interest with… Read More
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Welcome to the Denton Vacuum Applications Laboratory Denton Vacuum has hit a milestone with the Customer Application Development Center, the Apps Lab, as we pass the 10-year mark. The CADC empowers innovation by producing state-of-the-art sputtered, etch, and evaporated thin films and evaluating machine performances with our cutting-edge tools. In the CADC, Denton has three… Read More
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Enable Uniform Removal of the Entire Layer Regardless of Chemical Composition The Infinity FA from Denton Vacuum is optimized for delayering applications. The Infinity FA can utilize multiple etch technologies for uniform removal of layers. This high-performance etch tool is designed for delayering finished or in-process integrated circuits for failure analysis or reverse engineering. Learn… Read More
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Thin film coating is an important part of the sample preparation process for microscopy. Samples typically undergo a different preparation process depending on the type of microscope being used for observation, but there are two important factors to consider when coating samples for either type. Scanning Electron Microscopy (SEM) Sample Prep Biological materials, which include… Read More