See how Denton Vacuum has pioneered thin film for 6 decades.
Posted on
The process tunability of PIB-CVD makes it optimal for many thin film applications. The inherent tunability of PIB-CVD enables a wide range of film properties including flowable, soft, thin film encapsulation layers as well as hard, highly hydrophobic, and optically clear coatings. As a result, multilayer and gradient coatings can be produced in a single chamber from… Read More
Posted on
Semiconductor manufacturing often takes a hardware-centric perspective when selecting equipment and vendors. However, manufacturers can benefit from a vendor’s industry experience and, instead, take an application-specific route. A partner like Denton Vacuum, with decades of experience, can address key concerns to get you to production faster than piecing together OEM parts. Working with a single vendor, or… Read More
Posted on
Secondary ion mass spectroscopy (SIMS) is a technique for compositional analysis of solid surfaces (such as semiconductors) in which material is removed from a surface by ion beam sputtering and the resultant positive and negative ions are analyzed in a mass spectrometer. This technique can be used to analyze the composition of semiconductor devices and… Read More
Posted on
Semicon West 2022 connected business and technology leaders, researchers, and industry analysts from across the microelectronics supply chain in California and online for their annual event. Here are some key takeaways from the conference. Semiconductor Market on Track to a Trillion The semiconductor industry faced several recent challenges and has seen disruptions. A crisis response… Read More
Posted on
What is plasma and why is it important in enabling thin film innovation? Plasma is the 4th state of matter after solid, liquid, and gas. Plasma contains a significant portion of charged particles, both ions and electrons. The presence of these charged particles makes plasma distinct from the other fundamental states of matter. Plasma is… Read More
Posted on
Inverted cylindrical magnetron (ICM) sputtering is the optimal choice for applications that require ultra-uniform coatings on flat substrates. For example, ICM sputtering offers uniformity below 1% on standard 200mm wafers. ICM sputtering follows the same steps as conventional magnetron sputtering except a cylindrical cathode is used instead of a planar cathode. Instead of sputtering up… Read More